Magnetron sputtering system for laboratory research
The deposition is carried out by method of magnetron sputtering with preliminary ion-beam cleaning. The coatings are deposited on substrates installed on a substrate holder of the disk type.
Technical data:
| Maximum substrate diameter | 200 mm |
| Ultimate residual pressure in the clean technological vacuum chamber | 5E-4 Pa |
| Ultimate uniformity of coatings in thickness | ± 3,0 % |
| Coatings control | – Quartz thickness control system
– Time control |
Technological devices:
- DC- magnetrons
- Pulse DC-magnetron
- Ion beam cleaning source
- RF- magnetron
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