The electron source is a neutraliser based on a gas discharge inverse magnetron and is designed to compensate the spatial charge of the ion beam.
In the working volume limited by a cylindrical graphite target, a magnetron discharge is formed due to the interaction of process gas and crossed magnetic and electric fields. Closed magnetic field lines localise the plasma on the surface of the target-cathode. Electrons emitted from the cathode surface and generated in the plasma by ion bombardment are accelerated towards the ion beam and compensate for it.
Application:
Electron sources are used as compensators for ion beams emitted by various types and models of ion beam devices.
Main task:
– source of electrons for ions discharge compensation on a substrate for coating defects elimination.
Magnetron neutralizer is used in Diamanta.
Technical data:
| Parameters | Basic | Options |
| Source type | cylindrical inverse magnetron | |
| Working pressure | 0,06 ÷ 2 Pa | |
| Target material | graphite | by request |
| Target size | Ø20×30 mm | by request |
| Anode | no | magnetized, hidden, etc. |
| Magnetic system | Permanent magnets NdFeB+2xNi | |
| Target cooling | indirect | |
| Power supply | DC, DC-pulse, MF-AC | RF, HiPIMS |
| Specific maximum power DC/DC-pulse/MF-AC | 15 W/cm² | |
| Specific maximum power RF | 3 W/cm² | |
| Target utilization | 15…40 % | >45 % |
| Gas flow (depends on pumping) | 5…50 cm3/min | |
| Mean time between maintenance (mtbm) | 120 h | |
| Cooling | water | |
| Cooling water temperature | 18…25 °C | |
| Water pressure | 2…4 bar | |
| Water flow | >0,7 l/min/kW | |
| Working gas | Ar, O2 and other | |
| Working gas purity | 99.99 % | |
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