OCP® Singlewave

System of automatic single wave optical control of the sputtering process

Features:

Monitoring on substrates moving at high speed due to minimized measurement time
Calibration of the reference signal eliminates any signal variations not directly related to the film deposition process
Mathematical algorithm for approximation of measured data
High accuracy of layer deposition process stop

User friendly interface of OCP software provides all visual information to operate process in automatic or manual mode.

Technical data:

Spectral subrange	220-380 nm	380-1100 nm	1100-1650 nm	1650-2500 nm
Spectral resolution	0,8 nm	0,8 nm	1,6 nm	3,2 nm
Wavelength accuracy	± 0,2 nm	± 0,2 nm	± 0,4 nm	± 0,8 nm
Wavelength repeatability	± 0,1 nm	± 0,1 nm	± 0,2 nm	± 0,4 nm
Monitor types	Intermittent (direct): transmission continious (indirect): transmission, reﬂection, backside reﬂection
Baseline stability, %	±0,1 / hour	±0,1 / hour	±0,25 / hour	±0,75 / hour
Dark noise, %	±0,01@550 nm	±0,01@550 nm	±0,1@1550 nm	±1@2100 nm
Stray light, %	0,3@250 nm	0,05@550 nm	0,1@1550 nm	0,1@2100 nm
Built-in PC	Yes
Light source	Deuterium lamp	Halogen lamp (DC-controlled power supply)
Detector	Si		IGA
Software for thin ﬁlm design	OptiLayer, IzoSpectra, FilmStar, MS Excel, Essential Macleod
Data exchange	OPC UA Modbus TCP/IP Other by request
Test glass changer	8 position test glass changer integrated with 4 position cooled quartz crystal changer

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