Vacuum coating systems with electron beam evaporation technology for UV, Visible, near and mid-IR ranges
Examples of use:
- Anti-reflective coatings
- Beam splitters
- Narrowband pass filters
- High reflective coatings
- Polarizers
- Laser optics
- IR coatings on various substrates
- UV coatings
Features and equipment:
- Dome or planetary substrate holder
- Customized holders for non-standard substrates
- Up to 2 electron beam evaporation systems with different crucibles
- Resistive evaporation source
- Ion-beam assist source of various types (ALS (Anode Layer Plasma Acceleration source), End-Hall ion source, RF ion source)
- Fully automatic process control system by coatings optical parameters
- Substrate heating system
Technological devices:
- Electron-beam evaporation system
- Resistive evaporation system
- RF Ion-beam source for cleaning and assisting
- Ion-beam source for cleaning and assisting (ALS or End-Hall)
Technical data:
| Diameter of the technological vacuum chamber | 1500 mm |
| Diameter of dome substrate holder | 1400 mm |
| Maximum quantity of substrates of 30 mm diameter per one run | 800 pcs. |
| Maximum substrate diameter for dome substrate holder | 580 mm |
| Maximum coating thickness uniformity for the whole area
of dome substrate holder |
<± 2 % |
| Maximum coating thickness uniformity for the whole area of planetary substrate holder | <± 1,5 % |
| Ultimate residual pressure in the clean technological vacuum chamber | 8E-4 Pa |
| Coatings control | Quartz system for thickness control single wave optical monitoring system |
| Coatings | MgF2, SiOX, ZnS, Ta2O5 etc. |
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