Ion-beam treatment of the surface defined as a certain effect resulting from applying ion beams (of a certain character with defined energy and ions density) to the target object.
End-hall ion-beam sources form intensive (high dense) low-energy ion beams in vacuum. The source creates cone divergent beam of working gas ions.
Application:
“Strelock” ion-beam source applied in vacuum technological systems for assisting the process of films deposition with low-energy ions of inert or reactive gases. “Strelock” can be applied in technological processes of ion-beam cleaning, reactive ion-beam etching, coatings synthesis from gas phase, etc.
Main tasks:
In the production of optics, microelectronics, mechanical engineering, medicine for low-energy ion cleaning of substrates and assisting film coating processes by evaporation and deposition in vacuum, as well as for synthesis of coatings from the gas phase, reactive etching, plasma chemical reactions (acidification, nitriding) and other technological processes, as well as for scientific research.
End-hall gridless ion beam source “Strelok” is used in Elato and Ortus.
Technical data:
| Parameters | Basic | Options |
| Source type | end-hall | |
| Working pressure | 0,009 ÷ 1,5 Pa | |
| Aperture diameter | Ø50 mm | by request |
| Magnetic system | Permanent magnets NdFeB+2xNi | |
| Gas distributor | yes | |
| Anode voltage | 60 ÷ 250 V | by request |
| Anode current | up to 8 A | by request |
| The average ion energy | 24 ÷ 150 eV | by request |
| Ion current | up to 1 A | by request |
| Ion current density | <1 mA/cm² | |
| Gas flow | 5…40 cm³/min | |
| Cooling | water | |
| Cooling water temperature | 18…25 °C | |
| Water pressure | 2…4 bar | |
| Water flow | >0,7 l/min/kW | |
| Working gas | Ar, O² and other | |
| Working gas purity | 99.99 % | |
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